Tem Investigation of Grain Boundaries in Polycrystalline Silicon

نویسندگان

  • Y. Oei
  • F. Schapink
  • S. Radelaar
چکیده

The structure of two near-coincidence boundaries (close to a I = 7 and a Z = 9 misorientation) occurring in commercial poly-silicon has been examined in TEM. Both the structure of secondary dislocation networks as well as the occurrence of a-fringes (indicating a relative translation of the crystals along the boundary) were investigated. The near Z = 7 boundary is found to contain a simple network in addition to a regular array of steps. The near Z = 9 boundary exhibits a-fringes and a dislocation network which appears as a different structure for different diffraction conditions.

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تاریخ انتشار 2018